Metal Etch Data for Fault Detection Evaluation
This data set consists of the engineering variables from a LAM
9600 Metal Etcher over the course of etching 129 wafers. The data
consists of 108 normal wafers taken during 3 experiments (numbers
29, 31 and 33) and 21 wafers with intentionally induced faults taken
during the same experiments. Note that the experiments were run
several weeks apart and data from different experiments has a different
mean and somewhat different covariance structure. The experiment
number is in the name of the wafer in the calib_names and test_names
fields, respectively.
For more information about this data set, please see: B.M. Wise,
N.B. Gallagher, S.W. Butler, D.D. White, Jr. and G.G. Barna, "A
Comparison of Principal Components Analysis, Multi-way Principal
Components Analysis, Tri-linear Decomposition and Parallel Factor
Analysis for Fault Detection in a Semiconductor Etch Process",
J. Chemometrics, 13, 379396 (1999).
The data is stored as a MATLAB structure array. The specific fields
in this structure array are described below:
INFORMATION: [ 29x63 char] Information about the data
calibration: {108x1 cell} The normal or calibration wafers
calib_names: [108x9 char] Names of the calibration wafers
test: { 21x1 cell} The test or faulty wafers
test_names: [ 21x9 char] Names of the test wafers
fault_names: [ 21x9 char] Names of the specific faults
variables: [ 21x14 char] Names of the variables
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| Name | Size | Kind | Last Modified | |
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MACHINE_Data.mat | 2.1MB | MATLAB document | Mon, May 24, 1999, 10:18 AM |
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OES_DATA.mat | 4.7MB | MATLAB document | Mon, May 24, 1999, 12:12 PM |
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RFM_DATA.mat | 1.9MB | MATLAB document | Mon, May 24, 1999, 01:08 PM |
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